During the last decade the fabrication of functional nanostructures has become increasingly important for the development of new applications for advanced microscopy. Such developments are based on a fundamental understanding of the physical and chemical properties of materials. Within the diverse range of fabrication methods, maskless direct-write techniques enable rapid-prototyping with superb spatial resolution down to the lower nanoscale. At FELMI, our activities in this field are based mainly on two techniques: focused electron beam induced processing (FEBIP) and focused ion beam processing (FIB). Both provide unique fabrication and analysis capabilities. Our main interest is a fundamental understanding of fabrication processes, related material properties and the development of new application concepts.
Our major research activities are:
Focused Electron Beam Induced Prosessing (FEBIP)
Focused Ion Beam Processing (FIB)